Please use this identifier to cite or link to this item:
doi:10.22028/D291-24676
Title: | Production of Si3N4/TiN nano composites |
Author(s): | Fricke, Markus Nonninger, Ralph Schmidt, Helmut K. |
Language: | English |
Year of Publication: | 2000 |
OPUS Source: | Advanced engineering materials. - 2. 2000, 10, S. 647-652 |
SWD key words: | Nanokomposit Zinn Chemischer Prozess |
DDC notations: | 540 Chemistry |
Publikation type: | Journal Article |
Abstract: | Silicon nitride is used in different applications because of its resistance against thermal shock, igh temperature and mechanical load. An appropriate second phase like TiN could make Si3N4 attractive for additional applications. This work deals with the introduction of a TiN phase from a nanosize TiN powder into the Si3N4 matrix by a single-step wet chemical process. |
Link to this record: | urn:nbn:de:bsz:291-scidok-30018 hdl:20.500.11880/24732 http://dx.doi.org/10.22028/D291-24676 |
Date of registration: | 14-Oct-2010 |
Faculty: | SE - Sonstige Einrichtungen |
Department: | SE - INM Leibniz-Institut für Neue Materialien |
Collections: | INM SciDok - Der Wissenschaftsserver der Universität des Saarlandes |
Files for this record:
File | Description | Size | Format | |
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sm200019.pdf | 1,17 MB | Adobe PDF | View/Open |
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